ICP Plasma Cleaner

Product Description: ICP Plasma Cleaner

Introduction:The ICP Plasma Cleaner is an advanced cleaning solution designed for various industrial and laboratory applications, particularly in the semiconductor, electronics, and materials research fields. This innovative device utilizes inductively coupled plasma technology to achieve unparalleled surface cleaning and etching, ensuring optimal adhesion and performance for subsequent processing steps. The ICP Plasma Cleaner’s compact design, user-friendly interface, and high throughput make it an essential tool for businesses striving for excellence in surface treatment.

View Details

Unique Features:

• High-Efficiency Plasma Generation: Achieves efficient cleaning with minimal gas consumption, reducing operational costs.
• Versatile Processing Modes: Supports a variety of cleaning processes including surface activation, organic contamination removal, and thin film deposition.
• Real-Time Monitoring: Equipped with an integrated diagnostic system that monitors plasma parameters to ensure consistent performance.
• User-Friendly Interface: Intuitive touchscreen controls enable easy operation and adjustment of cleaning conditions.

Specifications:

• Material: Constructed from high-quality stainless steel, ensuring durability and resistance to corrosion in demanding environments.
• Size: Compact footprint (dimensions: 600mm x 600mm x 1200mm) suitable for cleanroom applications.
• Weight: Lightweight design (approximately 150 kg) facilitates easy integration into various lab settings.
• Capacity: Capable of accommodating substrates up to 200mm in diameter.

Technology:

Naen Product Page

• AI Integration: Incorporates intelligent features for automated process optimization, allowing for real-time adjustment of plasma parameters based on substrate characteristics.
• Advanced Control System: Features a PLC-based control system for precise management of operational settings and data logging.

Performance:

• Efficiency: Achieves cleaning speeds of up to 50 mm/min, significantly enhancing throughput in busy production environments.
• Uniform Treatment: Ensures consistent surface treatment across various substrate materials, including silicon, glass, and polymers.

Problem-Solving Benefits:The ICP Plasma Cleaner addresses common challenges faced in surface preparation, such as inadequate cleaning and inconsistent adhesion. By providing a thorough, uniform cleaning process, it enhances the performance and longevity of coatings and adhesives. Additionally, the integration of AI technology allows businesses to optimize workflows and reduce downtime, resulting in improved productivity and cost savings.

Invest in the ICP Plasma Cleaner today to elevate your surface treatment processes and ensure the highest quality standards in your operations!

Related Products：ICP Plasma Cleaner